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Comparison of Conductance and Capacitance techniques for Measurement of Interface States in Thin Oxides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K4.9
- Print publication:
- 2001
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High Permittivity Oxide Gate Stacks on Silicon Incorporating UHV Silicon Nitride Interfacial Layers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K2.3
- Print publication:
- 2001
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- Article
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Atomic Force Microscope-Based Lithography of Titanium
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- Journal:
- MRS Online Proceedings Library Archive / Volume 380 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 125
- Print publication:
- 1995
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